Customized Big Stainless Steel Sheet PVD Coating Machine All of the benefits of the PVD Coating process that produce some of the toughest, most brilliant and cutting edge technology of our time ranging from microchips to solar panels, none is more important than the fact that PVD Coatings can be applied with no toxic residues or byproducts which degrade our planet鈥檚 environment. Craft of Metallizing coating machine Sputter coating process concept The so-called sputtering coating refers to bombarding the target with energetic particles (such as positive ions) in a vacuum chamber, so that the atoms or atomic groups on the surface of the target escape, and the escaped atoms form a film on the surface of the workpiece with the same composition as the target. , this method of preparing thin films is called sputtering. At present, sputtering is mainly used to form metal or alloy thin films, especially for making electrodes of electronic components and infrared reflective films on glass surfaces. In addition, sputtering is also used to prepare functional thin films, such as In2O3-SnO2 transparent conductive ceramic thin films for liquid crystal display devices. There are two ways of sputtering coating: one is called ion beam sputtering, which refers to bombarding the target surface with an ion beam in a vacuum state, so that the sputtered particles form a film on the surface of the substrate. This process is relatively expensive and is mainly used to prepare special The other is called cathode sputtering, which mainly uses the phenomenon of low-pressure gas discharge, so that the ions in the plasma state bombard the target surface, and the sputtered particles are deposited on the substrate. It adopts a parallel plate electrode structure, a large-area target made of membrane material is a cathode, and a substrate supporting the base is an anode, which is installed in a bell-jar type vacuum container. In order to reduce pollution, the pressure in the bell jar was first pumped to less than 10-3~10-4Pa, and then filled with Ar to maintain the pressure at 1~10Pa. A voltage of several thousand volts is applied between the two electrodes for sputter coating. Compared with evaporation coating, the target material (film material) has no phase change during sputtering coating, the compound composition is stable, and the alloy is not easy to fractionate, so the film material suitable for preparation is very wide. Since the energy of the particles deposited on the substrate by sputtering is 50 times higher than that of the evaporation, they have the effect of cleaning and heating the substrate, so the formed film has strong adhesion. In particular, sputtering coating is easy to control the composition of the film. Through direct sputtering or reactive sputtering, various alloy films, compound films, multi-layer films and composite films with large and uniform areas can be prepared. Sputtering coating is easy to realize continuous, automated operation and large-scale production. However, due to the use of high voltage and gas during sputtering, the device is relatively complicated, the thin film is easily affected by the sputtering atmosphere, and the thin film deposition rate is also low. In addition, sputtering coating needs to prepare targets of various components in advance, which is inconvenient to load and unload the target, and the utilization rate of the target is not too high. Parameter Application Our companyCustomized Big Stainless Steel Sheet PVD Coating Machine website:http://www.lk-bts.com/big-stainless-steel-sheet-pvd-coating-machine/